钨
渗透(战争)
通量
饱和(图论)
穿透深度
等离子体
材料科学
离子
氢
扩散
分析化学(期刊)
复合材料
热力学
冶金
化学
光学
色谱法
核物理学
有机化学
工程类
物理
组合数学
数学
运筹学
出处
期刊:Physica Scripta
[IOP Publishing]
日期:2014-04-01
卷期号:T159: 014044-014044
被引量:159
标识
DOI:10.1088/0031-8949/2014/t159/014044
摘要
Although extensive studies on hydrogen (H) retention in tungsten (W) loaded by ion implantation, plasma exposure and gas charging have been done, reported amounts of H retained in W, and their dependences on the incident flux, fluence and temperature are very inconsistent. The present work aims at the clarification of the H retention mechanisms with critical review of reported data and presentation of recent results. H diffusion coefficient for dissolved H in W is large enough to allow for a deep penetration of H into W bulk. Energetic H loading results in H saturation in the subsurface layers. The thickness of the saturated layers could grow under prolonged loading and the H in the layers remain long or hard to remove. Both the growth of the thickness of the saturated layers and the deep penetration of H into the bulk could result in significantly large H retention in W and dissipate the advantage of W as plasma facing wall.
科研通智能强力驱动
Strongly Powered by AbleSci AI