X射线光电子能谱
成核
氧化物
合金
退火(玻璃)
材料科学
铬
分析化学(期刊)
冶金
化学工程
化学
环境化学
有机化学
工程类
作者
Benjamin Lynch,Frédéric Wiame,Vincent Maurice,Philippe Marcus
标识
DOI:10.1016/j.apsusc.2021.151681
摘要
High resolution X-ray photoelectron spectroscopy analysis has been used to investigate, in-situ, the mechanisms for oxide nucleation and growth on a FeCrNiMo single crystal alloy. Ultra-high vacuum conditions provided the ideal environment in which an oxide-free surface could be oxidised in a controlled manner, using extremely low pressures and step-wise exposures of oxygen. In-situ snapshot measurements, which records an XPS spectrum every 10 s, provided insight into the mechanisms of chromium and nitrogen segregation during annealing of the sample. High resolution XPS spectra was used to follow the evolution of the key elements at step-wise intervals, allowing for detailed insights into the nucleation and growth mechanisms. Angular XPS analysis provided further information on the in-depth distribution and stratification of the oxide film.
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