单层
材料科学
光电子学
异质结
带隙
光电效应
半导体
可见光谱
量子隧道
氧化物
纳米技术
冶金
作者
Heng‐Jui Liu,Jing-Ching Wang,Deok‐Yong Cho,Kang‐Ting Ho,Jheng‐Cyuan Lin,Bo-Chao Huang,Yue‐Wen Fang,Yuanmin Zhu,Qian Zhan,Lin Xie,Xiaoqing Pan,Ya‐Ping Chiu,Chun‐Gang Duan,Jr‐Hau He,Ying‐Hao Chu
出处
期刊:ACS Photonics
[American Chemical Society]
日期:2018-01-31
卷期号:5 (3): 1041-1049
被引量:27
标识
DOI:10.1021/acsphotonics.7b01339
摘要
The photoelectric effect in semiconductors is the main mechanism for most modern optoelectronic devices, in which the adequate bandgap plays the key role for acquiring high photoresponse. Among numerous material categories applied in this field, the complex oxides exhibit great possibilities because they present a wide distribution of band gaps for absorbing light with any wavelength. Their physical properties and lattice structures are always strongly coupled and sensitive to light illumination. Moreover, the confinement of dimensionality of the complex oxides in the heterostructures can provide more diversities in designing and modulating the band structures. On the basis of this perspective, we have chosen itinerary ferromagnetic SrRuO3 as the model material, and fabricated it in one-unit-cell thickness in order to open a small band gap for effective utilization of visible light. By inserting this SrRuO3 monolayer at the interface of the well-developed two-dimensional electron gas system (LaAlO3/SrTiO3), the resistance of the monolayer can be further revealed. In addition, a giant enhancement (>300%) of photoresponse under illumination of visible light with power density of 500 mW/cm2 is also observed. Such can be ascribed to the further modulation of band structure of the SrRuO3 monolayer under the illumination, confirmed by cross-section scanning tunneling microscopy (XSTM). Therefore, this study demonstrates a simple route to design and explore the potential low dimensional oxide materials for future optoelectronic devices.
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