Self-Assembled Nano-FeO(OH)/Reduced Graphene Oxide Aerogel as a Reusable Catalyst for Photo-Fenton Degradation of Phenolic Organics

气凝胶 石墨烯 催化作用 氧化物 化学工程 材料科学 浸出(土壤学) X射线光电子能谱 铁酸盐 纳米颗粒 降级(电信) 氧化铁 过氧化氢 化学 无机化学 纳米技术 有机化学 土壤水分 土壤科学 吸附 工程类 电信 计算机科学 环境科学
作者
Renlan Liu,Yiming Xu,Baoliang Chen
出处
期刊:Environmental Science & Technology [American Chemical Society]
卷期号:52 (12): 7043-7053 被引量:132
标识
DOI:10.1021/acs.est.8b01043
摘要

Fabrication of visible-light-responsive, macroscopic photo-Fenton catalysts is crucial for wastewater treatment. Here, we report a facile fabrication method for nano-FeO(OH)/reduced graphene oxide aerogels (FeO(OH)-rGA) equipped with a stable macrostructure and a high efficiency for catalytic degradation of phenolic organics. The structure of FeO(OH)/rGA was characterized by SEM, TEM, XPS, Raman analysis. The FeO(OH) is the main constituent of ferrihydrite, which dispersed in the graphene aerogel with a particle size of ∼3 nm can efficiently activate H2O2 to generate abundant •OH. The excellent performance of the FeO(OH)/rGO aerogel was specifically exhibited by the outstanding catalyst activity, sustained mineralization and eminent reaction rate for phenolic organics. A synergy effect between FeO(OH) and graphene aerogel was observed, which came from the extensive electron transfer channels and active sites of the 3D graphene aerogel and the visible-light-activated FeO(OH) and H2O2 consistently producing •OH. The FeO(OH)/rGA could be reused for 10 cycles without a reduction in the catalytic activity and had less iron leaching, which guarantees that the active ingredient remains in the gel. Moreover, the FeO(OH)/rGA induced photo-Fenton degradation of 4-chlorophenol under near neutral pH conditions because the tight connection of FeO(OH) with the rGO aerogel results in less iron leaching and prevents the generation of Fe(OH)3. The 4-chlorophenol was completely removed in 80 min with a 0.074 min–1 rate constant in the FeO(OH)-rGA/H2O2 photo-Fenton system under visible-light irradiation, and mineralization rate was up to 80% after 6 h. Oxidative •OH can continuously attack 4-chlorophenol, 2,4,6-trichlorophenol and bisphenol A without selectivity. These results lay a foundation for highly effective and durable photo-Fenton degradation of phenolic organics at near neutral pH and sufficient activation of H2O2 for future applications.
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