材料科学
薄膜
薄板电阻
化学气相沉积
透射率
微观结构
兴奋剂
透明导电膜
光电子学
化学工程
复合材料
纳米技术
图层(电子)
工程类
作者
Qian Gao,Hong Jiang,Yan Li,Yanping Ma,Xiang Li,Zhaohui Ren,Yong Liu,Chenlu Song,Guangting Han
标识
DOI:10.1016/j.jallcom.2013.05.108
摘要
In order to optimize the light trapping, textured SnO2:F (FTO) films have been successfully deposited and optimized on glass in large scale using atmospheric pressure chemical vapor deposition (APCVD) method on an industrial production line. The microstructures, optical and electrical properties of the films were investigated as a function of the total flow rate and fluorine doping concentration. The as-deposited FTO polycrystalline films possessed the tetragonal rutile structure of SnO2. Enhanced light trapping has been achieved with the increased surface roughness of the films by manipulating the total flow rate of monobutyltin trichloride (MBTC) and trifluoro acetic acid (TFA), while the corresponding high transmittance and conductivity remained stable. The optimized film with haze value of 10.9%, a figure of merit at the level of ∼10−3 and sheet resistance of ∼11 Ω sq−1, showed good potential to improve the efficiency of silicon thin film solar cells.
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