浅沟隔离
材料科学
晶体管
沟槽
栅氧化层
泄漏(经济)
辐射硬化
光电子学
辐射
阈值电压
离子
功率半导体器件
辐射损伤
重离子
辐照
电压
电气工程
复合材料
光学
化学
工程类
物理
图层(电子)
核物理学
有机化学
经济
宏观经济学
作者
Chenghao Yu,Ying Wang,Meng-Tian Bao,Xingji Li,Jianqun Yang,Fei Cao
标识
DOI:10.1109/ted.2021.3135369
摘要
In this work, the single-event burnout (SEB) and degradation behaviors induced by heavy-ion irradiation were investigated in an 80-V-rated SEB-hardened split-gate trench (SGT) power U-shaped metal-oxide-semiconductor field-effect transistor (UMOSFET). After SEB hardening, the SEB failure threshold voltage of the sample device was measured to be 90 V; furthermore, a permanent degradation of the drain leakage or gate leakage was found after irradiation when the reverse voltage exceeded 60 V. The simulation results demonstrate that the heavy-ion-induced transient high temperature is a common mechanism responsible for the severe degradation and the catastrophic SEB. In addition, an effective method to improve the degradation and SEB tolerances, which enhances the rated breakdown voltage of a device, was proven through simulations.
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