离子
等离子体
焊剂(冶金)
原子物理学
氩
波长
电容感应
材料科学
等离子体诊断
激发
托尔
化学
物理
光电子学
电气工程
工程类
有机化学
冶金
热力学
量子力学
作者
A. Perret,Pascal Chabert,Jean‐Paul Booth,J. Jolly,Jean Guillon,Ph. Auvray
摘要
Strong nonuniformities of plasma production are expected in capacitive discharges if the excitation wavelength becomes comparable to the reactor size (standing-wave effect) and/or if the plasma skin depth becomes comparable to the plate separation (skin effect) [M. A. Lieberman et al., Plasma Sources Sci. Technol. 11, 283 (2002)]. Ion flux uniformity measurements were carried out in a large-area square (40 cm×40 cm) capacitive discharge driven at frequencies between 13.56 MHz and 81.36 MHz in argon gas at 150 mTorr. At 13.56 MHz, the ion flux was uniform to ±5%. At 60 MHz (and above) and at low rf power, the standing-wave effect was seen (maximum of the ion flux at the center), in good quantitative agreement with theory. At higher rf power, maxima of the ion flux were observed at the edges, due either to the skin effect or to other edge effects.
科研通智能强力驱动
Strongly Powered by AbleSci AI