双折射
材料科学
光学
RGB颜色模型
偏振器
色度
原色
光电子学
物理
计算机科学
操作系统
作者
Meguya Ryu,Molong Han,Lina Grinevičiūtė,Jingwen Hu,Tania Moein,Reo Honda,Tomas Katkus,M. Tobin,Jitraporn Vongsvivut,Tomas Tolenis,Yoshiaki Nishijima,Soon Hock Ng,Saulius Juodkazis,Junko Morikawa
标识
DOI:10.1002/lpor.202200535
摘要
Abstract The birefringence analysis of thin m SiO 2 films deposited via evaporation at a glancing angle of to the normal on resist pillar arrays on Si and nanopatterned SiO 2 substrates is carried out by spectral and color (red–green–blue [RGB]) imaging modes. Retardance and birefringence of the films deposited over flat and structured regions can be distinguished with only ≈1% difference between neighboring regions for the visible spectral range using RGB numerical analysis of images. The Michel‐Lévy color map is used for color rendering of birefringence to make quantitative measurements by numerical RGB color filtering. It is shown that by using at 530 nm waveplate inserted at angle to the cross polarizer‐analyzer setup, the range of changes in chromaticity xy ‐coordinates expands approximately twice upon angular rotation of a birefringent sample. This facilitates a better signal‐to‐noise determination of birefringence. The proposed method with ‐plate color shifting can be directly used to determine birefringence from step‐like spectral features in reflection and transmission polariscopy. Direct measurement of birefringence () and retardance of SiO 2 chevron film is carried out using Berek compensator as a benchmark.
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