Diffusion limited synthesis of wafer-scale covalent organic framework films for adaptative visual device

材料科学 共价键 薄脆饼 共价有机骨架 聚合 聚合物 结晶 化学工程 预聚物 异质结 纳米技术 化学 有机化学 光电子学 复合材料 工程类 聚氨酯
作者
Minghui Liu,Junhua Kuang,Xiaocang Han,Youxing Liu,Wenqiang Gao,Shengcong Shang,Xinyu Wang,Jiaxin Hong,Bo Guan,Xiaoxu Zhao,Yunlong Guo,Jichen Dong,Zhiyuan Zhao,Yan Zhao,Chuan Liu,Yunqi Liu,Jianyi Chen
出处
期刊:Nature Communications [Nature Portfolio]
卷期号:15 (1) 被引量:2
标识
DOI:10.1038/s41467-024-54844-4
摘要

Synthesizing high-crystalline covalent organic framework films is highly desired to advance their applications in two-dimensional optoelectronics, but it remains a great challenge. Here, we report a diffusion-limited synthesis strategy for wafer-scale uniform covalent organic framework films, in which pre-deposited 4,4′,4″,4‴-(1,3,6,8-Tetrakis(4-aminophenyl) pyrene is encapsulated on substrate surface with a layer of covalent organic framework prepolymer. The polymer not only prevents the dissolution of precursor, but limits the reaction with terephthalaldehyde dissolved in solution, thereby regulating the polymerization process. The size depends on growth substrates, and 4-inch films have been synthesized on silicon chips. Their structure, thickness, patterning and crystallization degree can be controlled by adjusting building blocks and polymerization chemistries, and molybdenum disulfide have been used as substrates to construct vertical heterostructure. The measurements reveal that using covalent organic framework as a photosensitive layer, the heterojunction displays enhanced photoelectric performance, which can be used to simulate the adaptative function of visual system. The preparation of high quality crystalline covalent organic framework (COF) films without polymer contamination and controllable thickness is desirable for optoelectronic applications. Here, the authors report a diffusion-limited synthesis strategy for wafer-scale COF films with a controlled structure, thickness, patterning, and crystallization degree based on the adjustment of the precursor building block films.
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