In recent years, Copper iodide (CuI) is an emerging p-type wide bandgap semiconductor with high intrinsic Hall mobility, high optical absorption and large exciton binding energy.However, the spectral response and the photoelectric conversion efficiency are limited for CuI-based heterostructure devices, which is related to the difficulty in fabrication of high-quality CuI thin films on other semiconductors.In this study, a p-CuI/n-Si photodiode has been fabricated through a facile iodination method.Although the CuI thin film is polycrystalline with obvious structural defects, the CuI/Si diode shows a high weak-light sensitivity and a high rectification ratio of 7.6×10 4 , indicating a good defect tolerance.This is because of the unilateral heterojunction behavior of the formation of a p + n diode.In this work, the mechanism of photocurrent of the p + n diode has been studied comprehensively.Different monochromatic lasers with wavelengths of 400, 505, 635 and 780 nm have been selected for testing the photoresponse.Under zero-bias, the device is a unilateral heterojunction, and only visible light can be absorbed at the Si side.On the other hand, when a bias of -3 V is applied, the photodiode is switched to a broader "UV-Visible" band mode.Therefore, the detection wavelength range can be switched between the "Visible" and "UV-Visible" bands by adjusting the bias voltage.Moreover, the obtained CuI/Si diode was very sensitive to weak light illumination.A very high detectivity of 10 13 ~10 14 Jones can be achieved with a power density as low as 0.5 μW/cm 2 , which is significantly higher than that of other copper-based diodes.These findings underscore the high application potential of CuI when integrated with the traditional Si industry.