A Top-Down Polymer Collaborative Manufacturing of Perovskite Single Crystal Film Patterns

Single crystal high-resolution array patterning of halide perovskite films is a crucial step toward unlocking their full potential for various optoelectronic applications. The top-down manufacturing strategies are hindered by the intrinsic fragility and thermal instability of halide perovskites. Herein, we establish an integrated growth-patterning strategy using a polymer with polar functional groups, leveraging the polymer's steric hindrance effect during crystal growth, thus reducing nucleation density and suppressing crystal growth rate, and simultaneously, improving its mechanical strength and thermal stability by a coordinative polymer protective layer with the film surface. Moreover, the polar functional groups effectively suppress surface defects and enhance the crystalline quality through coordinative interaction. This integrated method can also be used to realize centimeter-sized (∼200 mm²) and high aspect ratio (10⁴) single crystal films growth and patterning in a variety of halide perovskites. The integrated growth-patterning strategy facilitates the commercialization of halide perovskites.