Investigation of H+ beam radiation on photoelectric performance of GaAs photocathodes

In order to research H⁺ beam radiation on photoelectric performance of GaAs photocathodes used in low-light-level optoelectronic devices, based on Monte-Carlo method, quick calculation of damage, along with effects of Cs and Cs-O activation layer on ion trajectory, performance, ionization of ions and recoils are discussed. From the simulation results, the average stopping range increases with the increase of incident energy, and the dispersion varies with the incident angle, the minimum dispersion at 1 keV is obtained at 60° when Cs-O ratio is 2:1, and the minimum dispersion at 2 keV is obtained at 60° when Cs-O ratio is also 2:1. In addition, the produced vacancies increase with the incident energy while the value is almost not influenced by the incident angle, and the backscattered ions increase as the incident angle increase both in 1 keV and 2 keV cases, and decrease with the incident energy. Also, ionization dominate the H⁺ ion bombarding process instead of producing vacancies and phonons. With the increase of incident energy, the percentage of ionization of ions increases, while those of phonons of ions and ionization of recoils decrease. However, the corresponding percentages of ions and recoils remain nearly unchanged with the increase of incident angle and the variation of composition of Cs or Cs-O activation layer.