氧化锡
材料科学
锡
氟
兴奋剂
图层(电子)
蚀刻(微加工)
沉积(地质)
透明导电膜
透射率
氧化物
化学工程
无机化学
纳米技术
光电子学
化学
冶金
古生物学
沉积物
工程类
生物
作者
Kuan‐Ting Lee,Shih‐Yuan Lu
出处
期刊:RSC Advances
[The Royal Society of Chemistry]
日期:2013-01-01
卷期号:3 (23): 9011-9011
被引量:5
摘要
A novel, facile, one-step Sn4+-based anodic deposition method was developed to flatten fluorine-doped tin oxide (FTO) layer, leading to a significant enhancement in visible light transmittances, from 79 to 85%. The Sn2+ necessary for the anodic deposition of SnO2 was generated in situ from the starting Sn4+ such that a slow and balanced deposition and acid-etching of SnO2 became possible. Furthermore, the fluoride ions released from the acid-etching of the starting FTO layer were later incorporated into the newly deposited SnO2 to make it fluorine-doped, giving rise to the formation of the conductive, much flattened FTO layer. The flattening of the FTO layer led to a significant light scattering reduction at the FTO-air interface and thus enhanced the light transmittances.
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