铌酸锂
材料科学
反应离子刻蚀
蚀刻(微加工)
制作
光电子学
抛光
感应耦合等离子体
薄膜
干法蚀刻
锂(药物)
波导管
纳米技术
光学
等离子体
复合材料
图层(电子)
替代医学
物理
病理
量子力学
医学
内分泌学
作者
Rongjin Zhuang,Jinze He,Yifan Qi,Yang Li
标识
DOI:10.1002/adma.202208113
摘要
Abstract Thin‐film lithium niobate (TFLN) has been widely used in electro‐optic modulators, acoustic‐–optic modulators, electro‐optic frequency combs, and nonlinear wavelength converters owing to the excellent optical properties of lithium niobate. The performance of these devices is highly dependent on the fabrication quality of TFLN. Although state‐of‐the‐art TFLN microrings with an intrinsic quality factor ( Q ‐factor) exceeding 1 × 10 7 have been realized by inductively coupled plasma–reactive ion etching (ICP‐RIE) and chemical mechanical polishing (CMP), ICP‐RIE has moderate throughput, moderate reproducibility, and high cost in etching TFLN, while CMP features moderate throughput and low cost in etching TFLN. Here, a wet etching method for TFLN, leading to the fabrication of a micro‐racetrack with an intrinsic Q ‐factor of over 9.27 × 10 6 is developed. The suitability of this method to fabricate a narrow coupling gap between the bus waveguide and microring enables the coupling conditions of the microring to be customized. This method features a high throughput, a high reproducibility, and a low cost in etching TFLN, showing the potential to boost the mass production of integrated LN photonic devices with high fidelity and affordability dramatically.
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