光刻胶
小型化
抵抗
平版印刷术
半导体工业
半导体
半导体器件制造
纳米技术
制造工程
材料科学
工程类
光电子学
薄脆饼
图层(电子)
作者
Kosuke Watahiki,Yoshihiro Midoh,Kazuya Okamoto
标识
DOI:10.1109/issm55802.2022.10027038
摘要
This paper focuses on advanced semiconductor photoresists and analyzes the patent data from the following four perspectives: relationship between semiconductor trends and resists; profit gains of the photoresist industry; advanced extreme ultraviolet lithography trends and sustainable development goals (SDGs); and patent quality and filing trends for photoresists. As a result, we obtain the trend of semiconductor photoresists accurately reflecting miniaturization and its relation to SDGs. In addition, a guideline for patent quality and information disclosure characteristics is obtained. Photoresist is a crucial component of the semiconductor industry in miniaturization, and patents are an effective application tool for the trend investigation.
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