材料科学
制作
电阻率和电导率
电导率
导电体
电磁屏蔽
复合材料
极限抗拉强度
纳米技术
光电子学
电气工程
医学
化学
替代医学
物理化学
病理
工程类
作者
Jizhen Zhang,Na Kong,Simge Uzun,Ariana Levitt,Shayan Seyedin,Peter A. Lynch,Si Qin,Meikang Han,Wenrong Yang,Jingquan Liu,Xungai Wang,Yury Gogotsi,Joselito M. Razal
标识
DOI:10.1002/adma.202001093
摘要
Abstract Free‐standing films that display high strength and high electrical conductivity are critical for flexible electronics, such as electromagnetic interference (EMI) shielding coatings and current collectors for batteries and supercapacitors. 2D Ti 3 C 2 T x flakes are ideal candidates for making conductive films due to their high strength and metallic conductivity. It is, however, challenging to transfer those outstanding properties of single MXene flakes to macroscale films as a result of the small flake size and relatively poor flake alignment that occurs during solution‐based processing. Here, a scalable method is shown for the fabrication of strong and highly conducting pure MXene films containing highly aligned large MXene flakes. These films demonstrate record tensile strength up to ≈570 MPa for a 940 nm thick film and electrical conductivity of ≈15 100 S cm −1 for a 214 nm thick film, which are both the highest values compared to previously reported pure Ti 3 C 2 T x films. These films also exhibit outstanding EMI shielding performance (≈50 dB for a 940 nm thick film) that exceeds other synthetic materials with comparable thickness. MXene films with aligned flakes provide an effective route for producing large‐area, high‐strength, and high‐electrical‐conductivity MXene‐based films for future electronic applications.
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