外延
基质(水族馆)
三元运算
图层(电子)
托尔
材料科学
氢
氯化物
结晶学
晶体生长
分析化学(期刊)
化学
光电子学
纳米技术
冶金
生物
热力学
物理
有机化学
程序设计语言
色谱法
计算机科学
生态学
作者
Takashi Matsumoto,Yoshisuke Miyaji,K. Kiuchi,Takamasa Kato
标识
DOI:10.7567/jjaps.32s3.142
摘要
A novel epitaxial growth technique–chloride multisource epitaxial growth–for ternary compounds is described. Beams of the source vapors, CuCl, Ga and S (Se), are supplied into a high-purity nitrogen or hydrogen atmosphere of 10 -4 Torr. The c -axis epitaxial growths of CuGaS 2 and CuGaSe 2 are attained on GaAs (100) substrates at 600–620°C. The effects of the CuCl/Ga supply ratio on the layer growth are examined. The epitaxial layers are strained compressively along the c -axis by the thermal expansion mismatch between the grown layer and the substrate.
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