材料科学
纳米尺度
堆积
图层(电子)
分子动力学
焓
沉积(地质)
凝聚态物理
化学物理
结晶学
纳米技术
热力学
计算化学
核磁共振
生物
物理
古生物学
化学
沉积物
作者
Qing Zhou,S. Li,Ping Huang,Kewei Xu,Wang Fei,Tianming Lu
出处
期刊:APL Materials
[American Institute of Physics]
日期:2016-09-01
卷期号:4 (9)
被引量:15
摘要
We present unusual high hardness (up to 7.7 GPa) achieved in Cu/Al multilayers relative to monolithic Cu and Al films (∼2 GPa and ∼1 GPa, respectively). Nanotwins and stacking faults (SFs) were proposed to be the main contributors of hardness enhancement, especially when h < 5 nm. Using molecular dynamics simulations of deposition, we demonstrated that intermixing near Cu/Al interface was paramount in stabilizing the SFs in both Cu and Al layers. Our experimental results indicated that the high strength caused by layer intermixing was in sharp contrast to the general belief that only sharp interface structures could strengthen the multilayers.
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