Fabrication of hollow metal oxide nanocrystals by etching cuprous oxide with metal(ii) ions: approach to the essential driving force

氧化物 材料科学 无机化学 纳米晶 带隙 金属 无定形固体 化学工程 纳米技术 化学 结晶学 冶金 光电子学 工程类
作者
Jong Hwa Sohn,Hyun Gil,Chang Woo Kim,Do Kyoung Kim,Young Soo Kang
出处
期刊:Nanoscale [Royal Society of Chemistry]
卷期号:5 (22): 11227-11227 被引量:27
标识
DOI:10.1039/c3nr03626j
摘要

Hollow metal oxide nanocrystals were prepared by etching cuprous oxide with metal ions and were applied as photoelectrodes. As a hard template, polyvinylpyrrolidone stabilized cuprous oxide (PVP-Cu2O) and non-stabilized cuprous oxide (nPVP-Cu2O) were synthesized by a precipitation method. Hollow iron oxide and cobalt oxide nanocrystals with a truncated octahedral morphology were fabricated by an etching reaction with transition metal(II) ions (Fe(2+) or Co(2+)). In the etching reaction process, a cationic exchange reaction occurs between the divalent metal ion and Cu(+) due to the higher Lewis acidity. Facet selective etching of cuprous oxide has been observed during the ionic exchange reaction of Cu(+) and O(2-) ions in PVP-Cu2O complexes with transition metal(II) ions (Fe(2+) or Co(2+)) at the surface of a (110) facet. Amorphous states of hollow metal oxide products were annealed to form α-Fe2O3 (hematite) and Co3O4 and their crystal structure was examined with X-ray diffraction and HR-TEM. The optical absorption behavior of semiconductor nanocrystals was measured with UV-vis spectroscopy to define band gap energy. The hollow hematite structure has a 2.08 eV band gap and Co3O4 (Co(II,III) oxide) has a 1.80 eV indirect band gap. Using these hollow nanocrystals, a metal oxide monolayer film was fabricated with a secondary growth approach and was studied for its photocatalytic properties.
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