Lv12
34 积分 2022-09-20 加入
An ionic liquid-based photoresist with expandable applications: direct patterning from small molecules via thiol-ene photopolymerization
1天前
已完结
Topology-Directed Siloxane-Based Thiol–Ene Photoresists for Ultraviolet Nanoimprint Lithography
4天前
已完结
Synthesis and Properties of a Biophenolic End-Capped Polyimide Photoresist with High Film Retention and Sensitivity
4天前
已完结
New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
1个月前
已完结
Low-dielectric benzocyclobutenyl polysiloxane resin: spatial structure design and photosensitive patterning performance
1个月前
已完结
Dual nonionic photoacids synergistically enhanced photosensitivity for chemical amplified resists
1个月前
已完结
All-Hydrocarbon Low-Dielectric Loss Benzocyclobutene-Encapsulated Photoresist with High Pattern Resolution
1个月前
已完结
Positive and Negative Dual-Type Hafnium-Based Hybrid Dry Photoresist for Nanolithography
2个月前
已完结
High patterning photosensitivity by a novel fluorinated copolymer formulated resist
5个月前
已完结
Ultrahigh-printing-speed photoresists for additive manufacturing
5个月前
已完结
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