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10 积分 2022-09-20 加入
New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
5天前
已完结
Low-dielectric benzocyclobutenyl polysiloxane resin: spatial structure design and photosensitive patterning performance
5天前
已完结
Dual nonionic photoacids synergistically enhanced photosensitivity for chemical amplified resists
5天前
已完结
All-Hydrocarbon Low-Dielectric Loss Benzocyclobutene-Encapsulated Photoresist with High Pattern Resolution
5天前
已完结
Positive and Negative Dual-Type Hafnium-Based Hybrid Dry Photoresist for Nanolithography
16天前
已完结
High patterning photosensitivity by a novel fluorinated copolymer formulated resist
4个月前
已完结
Ultrahigh-printing-speed photoresists for additive manufacturing
4个月前
已完结
Biobased Epoxy Resin with Inherently Deep-UV Photodegradability for a Positive Photoresist and Anticounterfeiting
4个月前
已完结
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance
4个月前
已完结
Positive and Negative Dual-Type Hafnium-Based Hybrid Dry Photoresist for Nanolithography
4个月前
已完结
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