Lv1
50 积分 2022-05-26 加入
Insight into the re-deposition equilibrium and mitigation of sn contaminant during hydrogen plasma cleaning
2个月前
已完结
Investigation of the morphological evolution mechanism of tin contamination under low-temperature hydrogen plasma
2个月前
已完结
Comparative Study of the Surface Cleaning for Ar-/He-Based Plasma Jets at Atmospheric Pressure
2个月前
已关闭
Reaction Pathways Between SnH4 and SnH Relevant to EUV Lithography: A DFT and TST Study
3个月前
已完结
Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning
3个月前
已完结
Investigation of the morphological evolution mechanism of tin contamination under low-temperature hydrogen plasma
3个月前
已完结
Insight into the re-deposition equilibrium and mitigation of sn contaminant during hydrogen plasma cleaning
3个月前
已完结
Study on the characteristics of atomic hydrogen cleaning carbon contamination on multilayers
9个月前
已完结
Vacuum cleaning of amorphous carbon using hydrogen plasma for EUV lithography
9个月前
已关闭
Actinic defect inspection and characterization for extreme ultraviolet mask blanks
9个月前
已完结
皖公网安备34019202002308
