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Diffusion-reaction modeling of atomic layer etching
2个月前
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Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching (PEALE) of SiO2 with high repeatability of cycles in industrial ICP reactor. I. experiment
3个月前
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Fluorocarbon (C4F8) assisted plasma-enhanced atomic layer etching (PEALE) of SiO2 with high repeatability of cycles in industrial ICP reactor. I. experiment
3个月前
已关闭
Living Radical Polymerization of Acrylates Initiated and Controlled by Organocobalt Porphyrin Complexes
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