Lv41
540 积分 2023-10-21 加入
Antimony‐Oxo‐Cluster‐Based Polymers as Positive‐Tone EBL/EUV Photoresists: Lithography Performance Enhancement by Network Structure Modulation
5小时前
已完结
Ellipsometrical detection of optical trapped nanoparticles by periodically localized light
11个月前
已完结
Mastering the resist-leaching and aqueous-contact-angle challenges
1年前
已完结
Surface property control for 193 nm immersion resist by addition of Si compound
1年前
已完结
Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization
1年前
已完结
Organotellurium compounds: an overview of synthetic methodologies
1年前
已完结
Quantum Dots Photoresist for Direct Photolithography Patterning
1年前
已完结
Theoretical Insights into the Solubility Polarity Switch of Metal–Organic Nanoclusters for Nanoscale Patterning
1年前
已完结
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