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30 积分 2025-01-22 加入
Resist degradation under plasma exposure: Synergistic effects of ion bombardment
2个月前
已完结
Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment
3个月前
已完结
Low-k material damage during photoresist ashing process
3个月前
已完结
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
3个月前
已完结
Characterization of post-etched photoresist and residues by various analytical techniques
3个月前
已完结
光刻技术与光刻胶材料的进展与未来趋势
7个月前
已完结
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