| 标题 |
Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment |
| 网址 | |
| DOI | |
| 其它 |
期刊:Plasma Processes and Polymers 作者:Dustin Nest; Ting‐Ying Chung; David B. Graves; Sebastian Engelmann; Robert L. Bruce; et al 出版日期:2009-09-18 |
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(2025-6-4)