Lv4
450 积分 2026-02-25 加入
Challenges and solutions for 14nm FinFET etching
2个月前
已完结
Highly Selective Isotropic Etching of Si to SiGe Using CF4/O2/N2 Plasma for Advanced GAA Nanosheet Transistor
3个月前
已关闭
Principles of Plasma Discharges and Materials Processing: Doping and crystallographic effects in Clatom etching of silicon
4个月前
已完结