Lv7
3300 积分 2025-07-05 加入
Evaluation of vapor pressure of MoO2Cl2 and its initial chemical reaction on a SiO2 surface by ab initio thermodynamics
5小时前
待确认
Effect of the H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition: Applications for Next-Generation Interconnects
1个月前
已完结
Functionalization of Si 3 N 4 with an aldehyde inhibitor for area selective deposition of HfO 2 and SiO 2
1个月前
已完结
Area-Selective Atomic Layer Deposition of Ruthenium on SiO2/W Patterns Using Silicon-Based Inhibitors
1个月前
已完结
Controlling tail-group configurations in self-assembled monolayers for high performance area-selective atomic layer deposition
1个月前
已完结
Physical approach to enhance the selectivity of SiO2 area-selective deposition using substrate biasing
1个月前
已关闭
Area-Selective Atomic Layer Deposition of Ru Using Phenyl Silane Inhibitors: Comparison between Amino and Methoxy Head Groups
1个月前
已完结
Effect of the H2/N2 Ratio on Molybdenum Nitride Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition: Applications for Next-Generation Interconnects
2个月前
已完结
Ferroelectric Enhancement in a TiN/Hf1–xZrxO2/W Device with Controlled Oxidation of the Bottom Electrode
7个月前
已完结
Giant energy storage and power density negative capacitance superlattices
7个月前
已完结
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