| 标题 |
Physical approach to enhance the selectivity of SiO2 area-selective deposition using substrate biasing |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A 作者:Arthur A. de Jong; Marc J. M. Merkx; Wilhelmus W. M. Kessels; Adriaan J. M. Mackus 出版日期:2026 |
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(2025-6-4)