Lv1
10 积分 2025-08-28 加入
General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination
18天前
已完结
Co-optimization method to reduce the pattern distortion caused by polarization aberration in anamorphic EUV lithography
18天前
已关闭
Source optimization method employing dynamic polarization aberration model for high-NA EUVL
18天前
已完结
Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers
1个月前
已完结
3D EUV mask simulator based on physics-informed neural networks: effects of polarization and illumination
1个月前
已完结
Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall
2个月前
已完结
Fast rigorous mask model for extreme ultraviolet lithography
2个月前
已完结
Optical test alignment using computer generated holograms
3个月前
已关闭
Understanding and measuring EUV mask 3D effects
4个月前
已完结
Integrating CNN and transformer for efficient lithography hotspot detection
6个月前
已关闭
皖公网安备34019202002308
