Lv3
326 积分 2024-12-19 加入
Mechanism of selective Si3N4 etching over SiO2 in hydrogen-containing fluorocarbon plasma
22天前
已完结
Investigations of electron attachment to the perfluorocarbon molecules c-C4F8, 2-C4F8, 1,3 C4F6, and c-C5F8
8个月前
已完结
Investigations of electron attachment to the perfluorocarbon molecules c-C4F8, 2-C4F8, 1,3 C4F6, and c-C5F8
8个月前
已关闭
Effect of NF3, WF6, and MoF6 Additive Gases on High Aspect Ratio Contact SiO2 Etching in c-C4F8/C4F6/Ar/O2 PlasmasC
9个月前
已完结
Suppression of the standing wave effect in high frequency capacitive discharges using a shaped electrode and a dielectric lens: Self-consistent approach
1年前
已完结
Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor
1年前
已完结
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