Lv1
40 积分 2021-10-10 加入
Fabrication of TiN metal hard masks via very-high-frequency-direct-current superimposed sputtering
2个月前
已完结
A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications
3个月前
已完结
Plasma etching resistance and mechanical properties of polymorph Gd2O3-MgO nanocomposite with Zr phase stabilizer incorporation
3个月前
已完结