Lv2
178 积分 2025-02-28 加入
Profile Control in Conductor Metal Wet Etch with Advanced Photoresists
3个月前
已完结
Heat-Assisted Direct Photopatterning of Small-Molecule OLED Emitters at the Micrometer Scale
3个月前
已完结
Scalable fabrication approach and fill factor optimization for single pixel microlens arrays
3个月前
已完结
Structure-Sensitivity Relationship of Base Self-Amplifying Polymers in 365-nm Photolithography: Experimental and Theoretical Studies
3个月前
已完结
Supercritical carbon dioxide cleaning ion-implantation photoresist from wafer
3个月前
已完结
Pattern collapse mitigation by controlling atmosphere during development process for semiconductor lithography
3个月前
已完结
Enhanced seismic sensing based on epoxy waveguide Bragg gratings
3个月前
已完结
Development of an intra-level mix-and-match lithography process using negative-tone photoresist AR-N 4400-10 S4 to combine i-line stepper and electron beam exposure
3个月前
已完结
INR - A NEGATIVE TONE I-LINE CHEMICALLY AMPLIFIED PHOTORESIST
3个月前
已完结
Effects of Bias Pulsing on Etching of SiO2 Pattern in Capacitively-Coupled Plasmas for Nano-Scale Patterning of Multi-Level Hard Masks
3个月前
已完结
皖公网安备34019202002308
