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Band-engineered high-k oxide nanodots embedded in Si3N4 charge-trap layers for enhanced flash memory performance
9小时前
待确认
Area-Selective Atomic Layer Deposition of TiN, TiO₂, and HfO₂ on Silicon Nitride with Inhibition on Amorphous Carbon
1个月前
已完结
Inhibitor-Free Area-Selective Deposition of Titanium Nitride
1个月前
已完结