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90 积分 2021-08-23 加入
A Highly Scalable Isolated Charge Trap Nitride Layer Implemented in a 176-layer 3D NAND Flash with Superior Threshold Voltage Distribution and Charge Retention
16天前
已完结
Enhancing plasma uniformity by employing non-uniform magnetic field modulation in capacitively coupled plasmas
18天前
已完结
How we made DRAM
1个月前
已完结
Improving film thickness uniformity on curved substrates via planar and cylindrical magnetron sputtering: Simulation and experimental validation
2个月前
已关闭
Deposition: Building Layers Atom by Atom
2个月前
已完结
Plasma Descum on Advanced Packaging Development
2个月前
已完结
Residual Gas Analyzers
2个月前
已完结
Beyond 10 μm Depth Ultra-High Speed Etch Process with 84% Lower Carbon Footprint for Memory Channel Hole of 3D NAND Flash over 400 Layers
3个月前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
4个月前
已完结
The future of two-dimensional semiconductors beyond Moore’s law
4个月前
已完结
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