Lv1
40 积分 2024-03-05 加入
Role of a cyclopentadienyl ligand in Hf precursors using H2O or O3 as oxidant in atomic layer deposition
15天前
已完结
Recent trends in thermal atomic layer deposition chemistry
15天前
已完结
Thermal stability studies for advanced Hafnium and Zirconium ALD precursors
15天前
已完结
Study of thermal properties of tetrakis(dimethylamido)zirconium as a precursor for atomic layer deposition processes
2个月前
已完结
Atomic Layer Deposition of ZrO2 Films at High Temperatures (>350 °C) Using a Modified Cyclopentadienyl Zr Precursor
2个月前
已完结
The effects of decomposition of CpZr(NMe2)3 on atomic layer deposition for high-k ZrO2 thin films
3个月前
已完结
Cl 在栅极氧化中的影响
11个月前
已关闭
Thermal oxidation and wet chemical cleaning of silicon wafers for industrial solar cell production
11个月前
已完结
https://doi.org/10.1557/PROC-447-115
11个月前
已关闭
DCE application in oxide furnace
11个月前
已完结
皖公网安备34019202002308
