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60 积分 2024-03-05 加入
Study of thermal properties of tetrakis(dimethylamido)zirconium as a precursor for atomic layer deposition processes
15天前
已完结
Atomic Layer Deposition of ZrO2 Films at High Temperatures (>350 °C) Using a Modified Cyclopentadienyl Zr Precursor
15天前
已完结
The effects of decomposition of CpZr(NMe2)3 on atomic layer deposition for high-k ZrO2 thin films
17天前
已完结
Cl 在栅极氧化中的影响
9个月前
已关闭
Thermal oxidation and wet chemical cleaning of silicon wafers for industrial solar cell production
9个月前
已完结
https://doi.org/10.1557/PROC-447-115
9个月前
已关闭
DCE application in oxide furnace
9个月前
已完结
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