Lv11
30 积分 2023-06-01 加入
Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
2小时前
待确认
High patterning photosensitivity by a novel fluorinated copolymer formulated resist
5天前
已完结
193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
17天前
已完结
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