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380 积分 2025-01-19 加入
Conductive polymers: A multipurpose material for protecting coating
11小时前
待确认
Chemically Resistant, Electric Conductive, and Superhydrophobic Coatings
11小时前
已完结
The effects of the bottom anti-reflective coating with different baked temperatures and thicknesses on nanoscale patterns
11小时前
已完结
Synthesis of copolymer containing anthracene group and its application in bottom anti-reflective coatings for KrF photoresist
12小时前
已完结
New Photoresist Materials for 157-nm Lithography. Poly[Vinylsulfonyl Fluoride-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene] Partially Protected with tert-Butoxycarbonyl
9天前
已完结
Recent progress of inorganic photoresists for next-generation EUV lithography
9天前
已完结
Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group
9天前
已完结
Synthesis and polymerization of active ester monomers based on 4-vinylbenzoic acid
17天前
已完结
Development of new resist materials for 193-nm dry and immersion lithography
3个月前
已关闭
Immersion Lithography: Photomask and Wafer-Level Materials
3个月前
已完结
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