Lv41
520 积分 2026-01-12 加入
HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
1小时前
待确认
AI-Driven Inverse Design of Complex Oxide Thin Films for Semiconductor Devices: A Case Study of Hf–Zr–O
14天前
已完结
Role of dose optimization in Ru atomic layer deposition for low resistivity films
29天前
已关闭
Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene
1个月前
已完结
Growth of thin films of molybdenum oxide by atomic layer deposition
1个月前
已完结
Deposition of molybdenum thin films by an alternate supply of MoCl5 and Zn
1个月前
已完结
Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2
1个月前
已完结
Molybdenum Thin Film Formation from Molybdenum Nitride Deposited by Plasma-enhanced Atomic Layer Deposition with Hydrogen-permeable Mechanical Capping Layer
1个月前
已完结
Deposition of molybdenum thin films by an alternate supply of MoCl5 and Zn
1个月前
已完结
Atomic layer deposition of MoNx thin films using a newly synthesized liquid Mo precursor
1个月前
已完结
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