Lv5
1555 积分 2020-04-16 加入
Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching
1个月前
已完结
Investigation of Bowing Reduction in SiO2 Etching Taking into Account Radical Sticking in a Hole
1个月前
已完结
Hf0.5Zr0.5O2薄膜的铁电性及其对MOSFET亚阈值摆幅的影响
5个月前
已完结
Chemistry in Cryogenic Etching: A Tutorial
5个月前
已完结
Cryogenic cyclical etching of Si using CF4 plasma passivation steps: The role of CF radicals
9个月前
已完结
Effect of NF3, WF6, and MoF6 Additive Gases on High Aspect Ratio Contact SiO2 Etching in c-C4F8/C4F6/Ar/O2 Plasmas
9个月前
已完结
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