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94 积分 2024-03-04 加入
Aging behavior of perfluorinated elastomer (FFKM) in the SC1 solution used in the semiconductor wet etching process
1个月前
已完结
A study on etching properties of 6061 Al alloy by dual-frequency (60 MHz/400 kHz) capacitively coupled Ar, Ar/O2, NF3/Ar and NF3/Ar/O2 plasma
1个月前
已完结
Effect of porosity on etching rate and crater-like microstructure of sintered Al2O3, Y2O3, and YAG ceramics in plasma etching
4个月前
已完结
Nano-YOF coatings with ultra-low etching rates in fluorocarbon plasma: influence of surface roughness on etching behavior
4个月前
已完结
Effect of coating density on plasma etch resistance and material loss of Y2O3 coatings
5个月前
已完结
Effect of bias power on the etching of aluminum alloys in inductively coupled HBr/Cl2/N2/O2 plasma
5个月前
已完结
Enhanced plasma corrosion resistance of Y2O3/Al2O3/Al multilayer substrate for fluorine functional interfaces
6个月前
已完结
Optimizing ion-assisted deposition: Passivation behavior of Y₂O₃ and YAG thin films in plasma environments
6个月前
已完结
Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3
6个月前
已完结
Enhanced Plasma Corrosion Resistance of Y2O3/Al2O3/Al Multilayer Substrate for Fluorine Functional Interfaces
6个月前
已完结
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