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98 积分 2024-03-04 加入
Effect of porosity on etching rate and crater-like microstructure of sintered Al2O3, Y2O3, and YAG ceramics in plasma etching
21天前
已完结
Nano-YOF coatings with ultra-low etching rates in fluorocarbon plasma: influence of surface roughness on etching behavior
21天前
已完结
Effect of coating density on plasma etch resistance and material loss of Y2O3 coatings
1个月前
已完结
Effect of bias power on the etching of aluminum alloys in inductively coupled HBr/Cl2/N2/O2 plasma
1个月前
已完结
Enhanced plasma corrosion resistance of Y2O3/Al2O3/Al multilayer substrate for fluorine functional interfaces
2个月前
已完结
Optimizing ion-assisted deposition: Passivation behavior of Y₂O₃ and YAG thin films in plasma environments
2个月前
已完结
Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3
3个月前
已完结
Enhanced Plasma Corrosion Resistance of Y2O3/Al2O3/Al Multilayer Substrate for Fluorine Functional Interfaces
3个月前
已完结
Insight into relationship between composition, thickness and electrochemistry behavior of oxide film formed on TA15 under different potentials in 0.5 mol·L−1 H2SO4
7个月前
已完结
Enhanced Plasma Corrosion Resistance of Y2O3/Al2O3/Al Multilayer Substrate for Fluorine Functional Interfaces
9个月前
已完结
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