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90 积分 2025-09-19 加入
Improved method for synthesis of substituted tetraphenylporphins
1个月前
已完结
Trends in photoresist materials for extreme ultraviolet lithography: A review
3个月前
已完结
Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography
4个月前
已完结
Evaluation of Sulfonium Borate Initiators for Cationic Photopolymerization and Their Application in Hot Lithography
6个月前
已完结
Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography
6个月前
已完结
Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography
6个月前
已完结
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