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90 积分 2025-09-19 加入
Trends in photoresist materials for extreme ultraviolet lithography: A review
1个月前
已完结
Performance Optimization of Sulfonium-Functionalized Molecular Resists for EUV and Electron Beam Lithography
1个月前
已完结
Evaluation of Sulfonium Borate Initiators for Cationic Photopolymerization and Their Application in Hot Lithography
3个月前
已完结
Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography
3个月前
已完结
Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography
3个月前
已完结
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