Lv11
30 积分 2026-06-25 加入
Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist
2小时前
已完结
Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist
2小时前
已完结
Quantitative evaluation of residual resist in electron beam lithography based on scanning electron microscopy imaging and thresholding segmentation algorithm
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已完结
Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art
2小时前
已完结
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