Lv5
1000 积分 2024-12-16 加入
Impact of N2O Plasma Reactant on PEALD-SiO2 Insulator for Remarkably Reliable ALD-Oxide Semiconductor TFTs
1个月前
已完结
Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
1个月前
已完结
Thermal annealing effects on the stress stability in silicon dioxide films grown by plasma-enhanced chemical vapor deposition
1个月前
已完结
Analysis of structural effect on mechanical stress at backside deep trench isolation using finite element method
1个月前
已完结
Electrical properties of low-temperature SiO2 thin films prepared by plasma-enhanced atomic layer deposition with different plasma times
1个月前
已完结
Development of an innovative low-temperature PEALD process for stress-compensated TiO2 and SiO2 multilayer anti-reflective coatings
1个月前
已完结
Micro-arc ignition on the oily surface of capacitively-coupled plasma
4个月前
已完结
Microarcing instability in RF PECVD plasma system
4个月前
已完结
Mixed Mode Cracking in Layered Materials
4个月前
已完结
Channel cracking in thin films on substrates of finite thickness
4个月前
已完结
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