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Modeling of defect generation during plasma etching and its impact on electronic device performance—plasma-induced damage
3小时前
待确认
Defect generation in electronic devices under plasma exposure: Plasma-induced damage
3小时前
已完结
Investigation of plasma-induced damage in silicon trench etching
3小时前
待确认
Semiconductor Material and Device Characterization
12天前
已完结
Kelvin Force Microscopy and corona charging for semiconductor material and device characterization
12天前
已完结
Kelvin Force Microscopy and corona charging for semiconductor material and device characterization
12天前
已完结
The Present Status and Recent Advancements in Corona-Kelvin Non-Contact Electrical Metrology of Dielectrics for IC-Manufacturing
12天前
已完结
The effect of TEOS plasma parameters on the silicon dioxide deposition mechanisms
2个月前
已完结
Deposition kinetics of silicon dioxide from tetraethylorthosilicate by PECVD
2个月前
已完结
Effect of SiO2 intermediate layer on Al2O3/SiO2/n+-poly Si interface deposited using atomic layer deposition (ALD) for deep submicron device applications
4个月前
已完结
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