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40 积分 2024-12-16 加入
A novel approach to monitoring of plasma processing equipment and plasma damage without test structures
5天前
已完结
<title>Plasma damage monitoring for PECVD deposition: a contact potential difference study and device yield analysis</title>
5天前
已完结
On a Method of Measuring Contact Electricity 1
15天前
已完结
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
3个月前
已完结
Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films
3个月前
已完结
Effects of Stacked Al2O3 / HFO2 Films Deposited in Deep Trench Isolation on White Pixels Noise
3个月前
已完结
Electrical properties of low-temperature SiO2 thin films prepared by plasma-enhanced atomic layer deposition with different plasma times
4个月前
已完结
Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films
4个月前
已完结
Overview of Pixel Scaling Technology in CMOS Image Sensor
6个月前
已完结
Overview of Pixel Scaling Technology in CMOS Image Sensors for Imaging and Sensing Applications
6个月前
已完结
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