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Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties
11天前
已完结
Contact potential difference methods for full wafer characterization of oxidized silicon
1个月前
已完结
A novel approach to monitoring of plasma processing equipment and plasma damage without test structures
1个月前
已完结
<title>Plasma damage monitoring for PECVD deposition: a contact potential difference study and device yield analysis</title>
1个月前
已完结
On a Method of Measuring Contact Electricity 1
2个月前
已完结
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
4个月前
已完结
Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films
5个月前
已完结
Effects of Stacked Al2O3 / HFO2 Films Deposited in Deep Trench Isolation on White Pixels Noise
5个月前
已完结
Electrical properties of low-temperature SiO2 thin films prepared by plasma-enhanced atomic layer deposition with different plasma times
5个月前
已完结
Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films
5个月前
已完结
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