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Two-regime property dependence on plasma power of plasma-enhanced atomic layer-deposited In2O3 thin films and underlying mechanism
4小时前
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In2O3 film prepared by a PEALD process with balanced oxygen radical supply and ion bombardment damage
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Surface reaction mechanism of atomic layer deposition of titanium nitride using Tetrakis(dimethylamino)titanium and ammonia
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P-type surface charge transfer doping of diamond via low-dimensional transition metal oxides
6个月前
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Liquid phase synthesis of diamond in hydrogen atmosphere
9个月前
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Competition between diamond nucleation and growth under bias voltage by microwave plasma chemical vapor deposition
10个月前
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