Lv31
242 积分 2024-09-25 加入
Introduction of a New Baffle-Plate Concept to Control the Gas Flow Behavior in a Large Volume PECVD Chamber
1小时前
待确认
Uniformity improvement of deep silicon cavities fabricated by plasma etching with 12-inch wafer level
1小时前
已完结
Gas baffle optimization for CF4 plasma uniformity in inductively coupled plasma etching: numerical simulations
6小时前
已完结
Lotus Metasurface for Wide-Angle Intermediate-Frequency Water–Air Acoustic Transmission
6个月前
已完结
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