Lv31
338 积分 2023-10-13 加入
Surface chemical changes of aluminum during NF3-based plasma processing used for in situ chamber cleaning
11天前
已完结
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
25天前
已完结
Strategic Selection of the Oxygen Source for Low Temperature‐Atomic Layer Deposition of Al2O3 Thin Film
25天前
已完结
Optoelectronic and structural properties of ITO/Ag/ITO transparent electrodes using ultraviolet laser annealing
30天前
已完结
Maximizing tandem solar cell power extraction using a three-terminal design
1个月前
已完结
An entropy-regulating molecular lock stabilizes formamidinium lead halide perovskite
1个月前
已完结
Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
2个月前
已完结
CORROSION STUDY OF A Zn–22Al–2Cu ALLOY WITH THE SURFACE MODIFIED BY AN Y2O3 THIN FILM
3个月前
已完结
Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films
3个月前
已完结
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings
3个月前
已完结
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