Lv3
240 积分 2022-05-18 加入
Study on photochemical analysis system (VLES) for EUV lithography
16天前
已完结
Study of de-protection reaction analysis system for EUV lithography
16天前
已完结
Grazing incidence mirrors for EUV lithography
4个月前
已完结
Enhancement of a 2477-nm line emitted by the plasma of a boron nitride capillary discharge irradiated by a high-intensity ultrashort laser pulse
5个月前
已完结
Laser assisted heating of extreme ultraviolet-emitting z-pinch plasmas
5个月前
已完结
Fundamental Research Activities of EUV Lithography at NewSUBARU Synchrotron Light Facility
6个月前
已关闭
Diffraction grating transmission efficiencies for XUV and soft x rays
6个月前
已完结
Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
6个月前
已完结
EUV-LET 2.0: a compact exposure tool for industrial research at a wavelength of 13.5nm
6个月前
已关闭
Sub-10 nm patterning using EUV interference lithography
6个月前
已完结
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