Lv31
240 积分 2022-05-18 加入
Development of a reflectometer for a large EUV mirror in NewSUBARU
17天前
已完结
Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging
17天前
已完结
Study on photochemical analysis system (VLES) for EUV lithography
2个月前
已完结
Study of de-protection reaction analysis system for EUV lithography
2个月前
已完结
Grazing incidence mirrors for EUV lithography
6个月前
已完结
Enhancement of a 2477-nm line emitted by the plasma of a boron nitride capillary discharge irradiated by a high-intensity ultrashort laser pulse
7个月前
已完结
Laser assisted heating of extreme ultraviolet-emitting z-pinch plasmas
7个月前
已完结
Fundamental Research Activities of EUV Lithography at NewSUBARU Synchrotron Light Facility
8个月前
已关闭
Diffraction grating transmission efficiencies for XUV and soft x rays
8个月前
已完结
Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
8个月前
已完结
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