Lv21
144 积分 2025-07-14 加入
Atomic layer etching of SiCO films with surface modification by O2 and CF4/NH3/Ar plasmas and desorption by IR annealing
12天前
已关闭
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism
27天前
已完结
An AI‐Enabled All‐In‐One Visual, Proximity, and Tactile Perception Multimodal Sensor
28天前
已完结
Quasiatomic layer etching of silicon nitride enhanced by low temperature
30天前
已完结
Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si
30天前
已完结
Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent
1个月前
已完结
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
1个月前
已完结
In Situ Monitoring of Etching Characteristic and Surface Reactions in Atomic Layer Etching of SiN Using Cyclic CF4/H2 and H2 Plasmas
1个月前
已完结
Selective functionalization of partially etched SiNx to enhance SiO2 to SiNx etch selectivity
1个月前
已完结
Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching
1个月前
已完结
皖公网安备34019202002308
