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190 积分 2023-08-21 加入
Atomic-scale study on nanoparticle removal mechanism during post-Cu CMP cleaning process using ReaxFF MD
3个月前
已完结
Modeling and Optimization of Wet ALE Process
3个月前
已完结
Atomic-Layer-Deposited Al2O3 Layer Inserted in SiO2/HfO2 Gate-Stack-Induced Positive Flat-Band Shift with Dual Interface Dipoles for Advanced Logic Device
7个月前
已完结
Safe Piranhas: A Review of Methods and Protocols
7个月前
已完结
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