Lv21
148 积分 2024-09-08 加入
A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography
4小时前
待确认
Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression
1天前
已完结
Update on main chain scission resists in Zeon for high-NA EUV lithography
1个月前
已完结
High–performance, multifunctional sustainable polycarbonates and application in negative–type photoresists
2个月前
已完结
Update on main chain scission resists in Zeon for high-NA EUV lithography
2个月前
已完结
Photo‐Patternable and Healable Polymer Semiconductor Enabled by Dynamic Covalent Disulfide Bonding
2个月前
已完结
Star Polymers
2个月前
已完结
Anionic Photoacid Generator Bound Polymer Photoresists With Improved Performance for Advanced Lithography Patterning
2个月前
已完结
Main chain decomposable star shaped polymer for EUV resist
2个月前
已完结
Nonchemically‐Amplified Molecular Resists Based on Calixarene Derivatives Enabling 14 nm Half‐Pitch Nanolithography
2个月前
已完结
Efficacy of BGJ398, a Fibroblast Growth Factor Receptor 1–3 Inhibitor, in Patients with Previously Treated Advanced Urothelial Carcinoma withFGFR3Alterations
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